| AFM system | Asylum Research MFP-3D SII SPA400/SPI3800 |
|---|---|
| Thermal analysis systems | DSC TA Q200 TG/DTA Shimadzu DTG-60 |
| Optical microscope systems | Olympus BX-53 P/U-LGPS / Mettler FP90 Keyence Fluorescence Microscope BZ-8100 |
| Spectrometer | FT-IR/pMAIRS Thermo Scientific Nicolet iS50 UV-vis-NIR spectrometer Jasco V-670 Agilent 8453 x2 Fluorescence spectrometer Jasco FP-8500 OcenOptics QE65000/DH-2000 Spectral analysis and simulation software SCOUT |
| Measurment systems | LCR meter Hioki IM3536 Thermal Diffusivity Analysis ai-phase Mobile M3 Source Measure Unit Keithley 2612B / Prober Apollowave MBP-55 Source Measure Unit Keithley 2470 / Vaccum Prober Apollowave MJ-8D EC Frontier ECstat-302 system |
| DLS | Otsuka nanoSAQLA |
| Langmuir trough | Lauda Filmwaage FW-1 |
| Photoirradiation systems | Asahi Spectra CL-1501, CL-1503 Asahi Spectra REX-250 San-Ei Electric UVF-203S x2 /204S x2 Asahi Spectra LAX-C100 |
| Synthesis | Glove Box Vac OMNI-LAB Organic synthesizer Eyela ChemStation PPS-5511 Refrigerated Centrifuges Hitachi CR20GIII |
| Sample Processing | Inkjet printing system, SIJ Spray coater system, SIJ Spin coater Mikasa MS-B100 Plasma etching equipment SAKIGAKE YHS-R Plasma etching equipment SAKIGAKE YHS-G Vacuum drying oven Eyela VOM-1000A (Bell Jar) Custom-made vacuum deposition system, Pascal Co., Ltd. |
